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Chemical Processing of SU-8 Photoresist to Record the Surface-Driven Microfluidic Flow of Dyed Working Liquid in the Regime of Fluid Mechanics

Subhadeep Mukhopadhyay


Chemical processing of negative photoresist SU-8 is performed to fabricate a set of three individual
SU-8 based glass microfluidic devices inside the cleanroom laboratory. The major steps of SU-8
processing are spin coating using a spin coater, soft baking, ultra-violet (UV) exposure, post exposure
baking, development by SU-8 developer, and hard baking. The indirect bonding for leakage-free
sealing is used during hard baking to fabricate the microfluidic devices. Author has prepared the
dyed water to be used as working liquid. Author has used the CMOS camera to record each capillary
flow of dyed water. Each fabricated device contains the arrays of square micropillars which are
fabricated on the glass bottom wall of device. The filling time of capillary meniscus is lower
corresponding to smaller side length of integrated square micropillars due to lower microfluidic
friction. Leakage-free surface-driven capillary flow is recorded corresponding to each fabricated
device. Nonlinear meniscus profile is recorded in each microfluidic device. The surface-driven
microfluidic flow is generated by thermodynamic reasons according to the published literatures. This
experimental work may be useful for commercial bioengineering applications in future.


Chemical processing, indirect bonding, maskless lithography, SU-8; working liquid

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