Specific Contact Resistance of CuxO Thin Films Deposited by r. f. Sputtering Method
Keywords:
CuxO thin films, contact resistivity, bulk resistivityAbstract
This paper contains measurement of contact resistivity and bulk resistivity of CuxO (0<x<1) thin films deposited by r. f. sputtering method. The conditions for deposition of CuxO thin film were optimized by varying the r. f. power to vary the contact resistivity and bulk resistivity. Electrical characterizations were performed by Transmission Line Model (TLM) and Vertical Transmission Model (VTM) studies. The films deposited on glass substrate have contact resistivity in the range 2.53 - 15 W-cm2 and bulk resistivity in the range 0.35 - 0.96 W-cm.
Keywords: CuxO thin films, contact resistivity, bulk resistivity
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