Numerical Simulation and Parameter Analysis for Pentacene based Organic thin Film Transistor with HfO2 Gate Dielectric
DOI:
https://doi.org/10.37591/josdc.v6i2.3343Keywords:
Numerical Simulation, OTFT, gate dielectricAbstract
This paper explains 2D numerical simulation and Characterization of Electrical parameter of Pentacene (Organic semiconductor) based Organic thin film transistor (OTFT) devices with HfO2 as a gate dielectric and Electrical parameters including; Threshold Voltage (Vt), Mobility (µ),Ion/Ioff, and Transconductance (gm), Sub threshold slope (SS) are extracted. The numerical simulation includes model for defect density of state and field dependent mobility model.
References
Cite this Article
Pooja Kumari, A. D. D. Dwivedi. Numerical Simulation and Parameter Analysis for Pentacene based Organic Thin Film Transistor with HfO2 Gate Dielectric. Journal of Semiconductor Devices and Circuits. 2019; 6(2): 28–34p.
Downloads
Published
2019-09-23
Issue
Section
Research Articles