Design And Validation of High Efficiency Of 10T Sram with High Recoverability Of Multi Node Soft Error

Authors

  • Punem Sangeetha M.Tech Student, Department of Electronics Engineering, Vignan’s Institute of Management and Technology for Women, Kondapur, Telangana, Andhra Pradesh, India
  • Vijaykumar R Urukude Assistant Professor, Department of Electronics Engineering, Vignan’s Institute of Management and Technology For Women, Kondapur, Telangana, Andhra Pradesh, India

DOI:

https://doi.org/10.37591/josdc.v10i2.7566

Keywords:

SRAM cell, architecture, microprocessor, multi node soft error, CMOS technology

Abstract

Sensitive nodes' critical charge is decreasing, which increases the soft-error vulnerability of SRAM cells used in aerospace applications. A single event upset (SEU) occurs when a radiation particle hits a sensitive node in a typical 6T SRAM cell, flipping the data that has been stored in the cell. Consequently, a Soft-Error-Aware Read-Stability-Enhanced Low Power 10T (SARP10T) SRAM cell is suggested in this project to reduce SEUs. The quadro cell exhibits greater promise as it provides strong performance with a moderate area overhead. Nevertheless, our analysis reveals that Quatro encounters a high rate of write failures with scaled technology parametric fluctuations, which hinders the use of this SRAM cell. Nevertheless, our analysis reveals that Quatro encounters a high rate of write failures with scaled technology parametric fluctuations, which hinders the use of this SRAM cell. SARP10T is compared with QUCCE12T, QUATRO12T, RHD12T, RHPD12T, and RSP14T—other newly announced soft-error-aware SRAM cells—to assess its relative performance. If a radiation attack flips the node values, all SARP 10T's sensitive nodes can recover their data. Moreover, single event multi-node upsets (SEMNUs) caused at its storage node pair can be recovered from using SARP10T. In addition to these benefits, the suggested cell has the best-read stability since it can recover from any disruption thanks to the '0'-storing storage node, which the bit line can access directly during read operations. Moreover, SARP10T uses the least amount of hold power. In comparison to most of the comparison cells, SARP10T also shows better write capabilities and a shorter write delay. The suggested cell achieves all these benefits with only a slightly longer read delay and a slightly higher read and write energy consumption.

References

Barth JL, Dyer CS, Stassinopoulos EG. Space, atmospheric, and terrestrial radiation environments. IEEE Transactions on nuclear science. 2003 Jun;50(3):466-82.

Robert C. Baumann, “Radiation-induced soft errors in advanced semiconductor technologies,” IEEE Trans. Devi. And Mate. Reli., vol. 5, no. 3, pp. 305-316, 2005.

T. Granlund, B. Granbom, and N. Olsson, “Soft error rate increase for new generations of SRAMs,” IEEE Trans. Nucl. Sci., vol. 50, no. 6, pp.2065–2068, Dec. 2003

M. A. Bajura, Y. Boulghassoul, R. Naseer, S. DasGupta, A. Witulski, and J. Sondeen et al., “Models and algorithmic limits for an ECC-based approach to hardening sub-100-nm SRAMs,” IEEE Trans. Nucl. Sci., vol. 54, no. 4, pp. 935–945, Aug. 2007

Gasiot G, Roche P, Flatresse P. Comparison of multiple cell upset response of BULK and SOI 130NM technologies in the terrestrial environment. In2008 IEEE International Reliability Physics Symposium 2008 Apr 27 (pp. 192-194). IEEE.

Artola L, Gaillardin M, Hubert G, Raine M, Paillet P. Modeling single event transients in advanced devices and ICs. IEEE Transactions on Nuclear Science. 2015 Jun 17;62(4):1528-39.

S. Kiamehr, T. Osiecki, M. Tahoori, and S. Nassif, “Radiation-induced soft error analysis of SRAMs in SOI FinFET technology: A device to circuit approach,” Proc. DAC 51th, San Francisco, CA, USA, 2014, pp. 1–6.

T. Calin, M. Nicolaidis, R. Velazco, “Upset Hardened Memory Design for Submicron CMOS Technology,” IEEE Trans. Nucl. Sci. vol. 43, no. 6, pp. 2874-2878, Dec. 1996.

Shah M. Jahinuzzaman, David J. Rennie, and Manoj Sachdev, “A Soft Error Tolerant 10T SRAM Bit-Cell With Differential Read Capability,” IEEE Trans. Nucl. Sci. vol. 56, no. 6, pp. 3768–3773. Dec. 2009.

Q. Wu et al., “Supply voltage dependence of heavy ion induced SEEs on 65 nm CMOS bulk SRAMs,” IEEE Trans. Nucl. Sci., vol. 62, no. 4, pp. 1898–1904, Aug. 2015.

Maxim S. Gorbunov, Pavel S. Dolotov, Andrey A. Antonov, Gennady I. Zebrev, Vladimir V. Emeliyanov, Anna B. Boruzdina, Andrey G. Petrov, Anastasia V. Ulanova, “Design of 65 nm CMOS SRAM for Space Applications: A Comparative Study,” IEEE Trans. Nuclear Sci. vol. 61, no. 4, pp. 1575-1582, Aug. 2014.

Mann RW, Calhoun BH. New category of ultra-thin notchless 6T SRAM cell layout topologies for sub-22nm. In2011 12th International Symposium on Quality Electronic Design 2011 Mar 14 (pp. 1-6). IEEE.

Neil HE Weste, David Money Harris, CMOS VLSI design: a circuits and systems perspective, Addison-Wesley, fourth edition, 2011

Published

2024-01-10

Issue

Section

Research Articles