Automatic Laser Propulsion Using Binary Mask

Abstract

In the mask propulsion, excimer laser micromachining using binary propulsion has been implemented for flash patterning of a monomicrometer features over wide areas of various substrates. The limit for depth of focus that determines the depth to width front ratios is given and demonstrated for different materials. Binary mask propulsion technique is found to harmonize to reproduce the mask features from the millimeter to the micrometer scale under peculiar focusing conditions. Huge arrays of 1 and 15 μm holes on Kapton are made with high resolution and uniform periodicity. Material removal rate (MRR) for the laser machining of these holes are perpend and the machining efficiency for these are endowed to have different dependence on the fluence. A saturation of hole-depth with increasing count of pulses is obtained. As design concealed in this project, the laser mask propulsion of the device is regulated by the automatic regulated system. It is difficult to frame of mask non-similar pattern for the laser masking, while the automatic control is an adjustable design used in the machine for acquiring different or unmatched pattern. The machine is made of plastic material as prototype design as modification can be processed into it.