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Analysis of Signal Delay in Carbon Nano Tube based Interconnects at 32 nm Technology Node

Ashish Jha, Suchitra ., Purushottam Kumawat

Abstract


Abstract

In the present world demand for portable devices and high speed processor is rising which brings out a challenging issue of scaling for designers. In this paper, we have presented the effect of copper and CNT based interconnects for different length at 32 nm technology node. The performance of both types of interconnects are analyzed and compared in form of propagation delay. Propagation delay in interconnects between the elements is major reason for glitches in the circuit. Replacement of the existing copper interconnects for global wire CNT based interconnects present a better option. Performance analysis in form of propagation delay at different lengths and frequencies reveal that CNT based interconnect is better compared to copper at 32 nm technology node.

Keywords: Propagation Delay, Interconnect, CNT

Cite this Article

Ashish Jha, Suchitra, Purushottam Kumawat. Analysis of Signal Delay in Carbon Nano Tube based Interconnects at 32 nm Technology Node. Journal of Microelectronics and Solid State Devices. 2018; 5(1): 20–26p.



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